BackUHN Centre for Microfabrication
c/o Duoaud Shah
124-100 College Street
Assets And Services
The facility offers unique capabilities for prototyping and microfabrication of polymer based lab-on-a-chip devices spread over 1,400 square feet of cleanroom space. These capabilities include photolithography, wet chemistry, hot embossing, electroplating and substrate bonding. Equipment and tools available in the two cleanrooms, ISO 6 and ISO 7 standards, are intended to be complementary to those available at the cleanroom network at the University of Toronto.
The main aim of the facility is to provide research tools to academics and industry partners which will enable advancement of microfabrication and microfluidics research. Currently, Dr. Lothar Lilge oversees the centre while Duoaud Shah is responsible for day to day operations and renders assistance to users. The facility as a whole falls under the purview of Techna. Jenoptik HEX-02 Hot Embossing Tool – The system provides users with maximum flexibility in the high precision moulding of polymer parts with dimensions of micro and nanometers with high aspect ratios. Due to its fast embossing time, high throughput capabilities are available for applications such as optical gratings and microfluidic chips for biomedical applications. The HEX-02 is fully automated and comes with powerful operational software. Intelligent Micro Patterning SF100-Xtreme Maskless Photolithography – The system enables high precision, quick turnaround maskless photoresist patterning with features as small as 1µm without the need for costly photomasks. Standard wavelength energies for compatibility with most commercial photoresists and polyimides are available with wavelengths selection possible via a 6 position filter wheel. Full automation and control software, coupled with a vibration isolation table ensures repeatability and consistency. Newport Oriel Mask Aligner and Exposure System – The system offers simple and precise photopolymerization of various photoresists at standard wavelengths using flood exposure. A highly collimated and uniform beam ensures maximum repeatability with the system housed on a vibration dampening optical table. The mask aligner comes with a stereo zoom microscope with an X-Y-Z positioning mount and an illumination source for the substrate and mask. It permits rapid scanning and magnification up to 90X.